Context: Lithographic machines are among the most complex and expensive machines used in chip manufacturing. They emit a steady stream of light in the ultraviolet spectrum and filter that light until it looks like the back of a microprocessor. They focus and direct light onto the photoplate with a precision of a few tens of nanometers to cut the plane of the part.
Huawei has patents for use in EUV lithography systems to create high-performance processors with sub-10 nm process nodes. This solves the problem of interference patterns produced by ultraviolet light, which would otherwise cause the violets to be uneven.
Huawei has solved a problem in the final stages of chip manufacturing created by ultra-short wavelength ultraviolet light (EUV). His patent describes an array of mirrors that split the light beam into sub-beams that collide with their own tiny mirrors. Each of these mirrors rotates differently, creating different interferences in the light. So when they recombine, the interference patterns cancel each other out, forming a single pole.
The EUV lithography system is currently only developed by the Dutch company ASML. EUV lithography is based on the same principles as older forms of lithography, but uses light at a wavelength of 13.5 nm, which is similar to X-rays. ASML emits ultraviolet light from molten droplets about 25 microns in diameter. In measure. Diameter.
See also: The art of reducing token size
"As they fall," ASML says, "the droplets are first produced by low-intensity laser pulses, which give them a pancake shape." A more powerful laser pulse vaporizes the plate droplet, creating a plasma that emits UV light. To create a microchip, this process is repeated 50,000 times per second.
It took ASML more than 6 billion euros and 17 years to develop commercially available UV lithography engines. But before this was done, the US government pressured the Dutch government to ban exports to China, restricting the country to old DUV (deep ultraviolet) technology. So far, only five companies are using or have announced ASML EUV lithography systems: Intel and Micron in the US, Samsung and SK Hynix in South Korea, and TSMC in Taiwan.
Chinese companies like Huawei may have already submitted their designs to factories like TSMC for EUV lithography production. But since the United States imposed sanctions on China, this situation has been declining. Huawei needs to find smart nodes using EUV lithography to continuously improve its processors, from smartphones to data centers. They still have a long way to go to build their own EV system, but they are getting a lot of capital and government support to implement it.
Credit stamp: Fritzchens Fritz
Posting Komentar